Hot Filament Chemical Vapor Deposition of Crystalline Boron

Hot Filament Chemical Vapor Deposition of Crystalline Boron Films. SEM micrographs. G. Soto and I. Gradilla Universidad Nacional Autónoma de México, Centro de Nanociencias y Nanotecnología, Km. 107 Carretera Tijuana-Ensenada, C. P. 22860, Ensenada B. C. , México Corresponding Address: CNy. N-UNAM P. O. Box 439036, San Ysidro, CA 92143 -9036, USA Tel: +52+646+ 175 -0650 E-Mail: gerardo@cnyn. unam. mx

Early nucleation of boron films with the substrate lightly abraded in a single direction with a 1 mm diamond paste. Deposition time 10 min, Ts= 530 °C , B 2 H 6 flow 4 ml min-1.

Early nucleation of boron films with the substrate lightly abraded without preferential direction with a 1 mm diamond paste. Deposition time 10 min, Ts= 530 °C , B 2 H 6 flow 4 ml min-1.

Sample showed in the main article. 4 h deposition time. Ts= 575 °C , B 2 H 6 flow 4 ml min-1 Hot Zone. Abraded substrate

Sample showed in the main article. 4 h deposition time. Ts= 575 °C , B 2 H 6 flow 4 ml min-1. Left, top: 2 mm from the hot zone. Right, top: 4 mm from the hot zone. Left, bottom: 6 mm from the hot zone. Right, bottom: 8 mm from the hot zone.

Second run to verify the condition of sample showed in the main article. Film fracture showed in the left. 4 h deposition time. Ts~ 575 °C , B 2 H 6 flow 4 ml min-1 Hot Zone. Abraded substrate.

Sample with conditions similar to showed in the main article. 4 h deposition time. Ts= 575 °C , B 2 H 6 flow 4 ml min-1 Hot Zone. Non-Abraded substrate

Boron films. Abraded substrate. Deposition time 4 h, Ts= 430 °C , B 2 H 6 flow 4 ml min-1.

Interesting morphologies of samples produced at Ts= 700 °C, Pressure 650 m. T, B 2 H 6, flow 20 ml min-1 Abraded substrate.

Interesting morphologies of samples produced at Ts= 700 °C, Pressure 650 m. T, B 2 H 6, flow 20 ml min-1 Abraded substrate. Second run.

Details of the sample at Ts= 700 °C, Pressure 650 m. T, B 2 H 6 flow 20 ml min-1 Abraded substrate.