Atomic Layer Deposition 1 Chemical Vapor Deposition 11
- Slides: 42
Atomic Layer Deposition 黃柏中 1
什麼是Chemical Vapor Deposition? 流程圖: 11 11
Plasma source之電子游離 O 2 for example: 23
PEALD 右圖為使用 PEALD的製程 circle。 24
ALD可沉積材料 1. II-VI化合物: Zn. S, Zn. Se, Zn. Te, Ca. S, Sr. S, Ba. S, Sr. S 1 -x. Sex, Cd. S, Cd. Te等 2. III-V化合物: Ga. As, Al. P, In. P, Ga. P, In. As, Alx. Ga 1 -x. As, Gax. In 1 -x. P 3. 氮(碳)化物半導體/介電材料: Al. N, Ga. N, In. N, Si. Nx 4. 導體: Ti. N(C), Ta 3 N 5, Nb. N(C), Mo. N(C) 5. 氧化物介電層: Al 2 O 3, Ti. O 2, Zr. O 2, Hf. O 2, Ta 2 O 5, Nb 2 O 5, Y 2 O 3, Mg. O, Ce. O 2, Si. O 2, La 2 O 3, Sr. Ti. O 3, Ba. Ti. O 3, Cr 2 O 3 6. 透明導體/半導體: In 2 O 3, In 2 O 3: Sn, In 2 O 3: F, In 2 O 3: Zr, Sn. O 2: Sb, Zn. O: Al, Ga 2 O 3, Ni. O, Co. Ox 7. 超導材料: YB 2 Cu 3 O 7 -x 8. 其他三元材料: La. Co. O 3, La. Ni. O 3 9. 氟化物: Ca. F, Sr. F, Zn. F 10. 單質材料: Si, Ge, Cu, Mo, Pt, W, Co, Fe, Ni, Ru 11. 其他: La 2 S 3, Pb. S, In 2 S 3, Cu. Ga. S 2, Si. C 31
價目表 換算成台幣約: 10, 455, 568+1242494=11, 698, 062 元 41
參考文獻 http: //www. isu. edu. tw/upload/81201/43/news/postfile_12877. pdf - 義守大學講義 https: //goo. gl/w. Yvi. Bk -光鋐科技講座投影片 http: //140. 110. 96. 15/tw/topic/file_download. php? topic_file_id=877 -中央研究院 _儀器科技研究中心 http: //www. polybell. com. tw/page/news/show. aspx? num=79&kind=11&page=2 – Polybell International https: //goo. gl/R 5 Ey 5 d -建德研究所資料 42
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