Lecture 7 OUTLINE Work Function MetalSemiconductor Contacts Energy
- Slides: 21
Lecture 7 OUTLINE • Work Function • Metal-Semiconductor Contacts – Energy band diagrams – Depletion-layer width – Small-signal capacitance Reading: Pierret 14. 1 -14. 2; Hu 4. 16
Metal-Semiconductor Contacts There are 2 kinds of metal-semiconductor contacts: • rectifying “Schottky diode” • non-rectifying “ohmic contact” EE 130/230 A Fall 2013 Lecture 7, Slide 2
Work Function E 0: vacuum energy level R. F. Pierret, Semiconductor Fundamentals, Figure 14. 1 FM: metal work function EE 130/230 A Fall 2013 FS: semiconductor work function Lecture 7, Slide 3
Ideal M-S Contact: FM < FS, n-type Band diagram instantly after contact formation: Equilibrium band diagram: EE 130/230 A Fall 2013 Lecture 7, Slide 4 R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 2
Ideal M-S Contact: FM > FS, n-type Band diagram instantly after contact formation: Equilibrium band diagram: Schottky Barrier Height: EE 130/230 A Fall 2013 q. Vbi = FBn– (Ec – EF)FB n Lecture 7, Slide 5 W R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 2
Effect of Interface States on FBn • Ideal M-S contact: FBn = FM – c • Real M-S contacts: A high density of allowed energy states in the band gap at the M-S interface “pins” EF to be within the range 0. 4 e. V to 0. 9 e. V below Ec FM FBn C. C. Hu, Modern Semiconductor Devices for ICs, Figure 4 -35 EE 130/230 A Fall 2013 Lecture 7, Slide 6
Schottky Barrier Heights: Metal on Si • FBn tends to increase with increasing metal work function EE 130/230 A Fall 2013 Lecture 7, Slide 7
Schottky Barrier Heights: Silicide on Si Silicide-Si interfaces are more stable than metal-silicon interfaces and hence are much more prevalent in ICs. After metal is deposited on Si, a thermal annealing step is applied to form a silicide-Si contact. The term metalsilicon contact includes silicide-Si contacts. EE 130/230 A Fall 2013 Lecture 7, Slide 8
The Depletion Approximation The semiconductor is depleted of mobile carriers to a depth W Þ In the depleted region (0 x W ): r = q (ND – NA) Beyond the depleted region (x > W ): r=0 EE 130/230 A Fall 2013 Lecture 7, Slide 9 R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 4
Electrostatics • Poisson’s equation: • The solution is: EE 130/230 A Fall 2013 Lecture 7, Slide 10 R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 4
Depletion Width, W At x = 0, V = -Vbi • W decreases with increasing ND EE 130/230 A Fall 2013 Lecture 7, Slide 11 R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 4
Voltage Drop across the M-S Contact • Under equilibrium conditions (VA = 0), the voltage drop across the semiconductor depletion region is the built-in voltage Vbi. • If VA 0, the voltage drop across the semiconductor depletion region is Vbi - VA. EE 130/230 A Fall 2013 Lecture 7, Slide 12 R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 3
Depletion Width, W, for VA 0 Last time, we found that At x = 0, V = - (Vbi - VA) • W increases with increasing –VA • W decreases with increasing ND EE 130/230 A Fall 2013 Lecture 7, Slide 13 R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 4
Charge Storage in a Schottky Diode • Charge is “stored” on both sides of the M-S contact. – The applied bias VA modulates this charge. R. F. Pierret, Semiconductor Fundamentals, Fig. 14. 4 EE 130/230 A Fall 2013 Lecture 7, Slide 14
Small-Signal Capacitance • If an a. c. voltage va is applied in series with the d. c. bias VA, the charge stored in the Schottky contact will be modulated at the frequency of the a. c. voltage ® displacement current will flow: EE 130/230 A Fall 2013 Lecture 7, Slide 15
Using C-V Data to Determine FB Once Vbi and ND are known, FBn can be determined: EE 130/230 A Fall 2013 Lecture 7, Slide 16
Ideal M-S Contact: FM > FS, p-type semiconductor Band diagram instantly after contact formation: Equilibrium band diagram: EE 130/230 A Fall 2013 Lecture 7, Slide 17 R. F. Pierret, Semiconductor Fundamentals, p. 482
Ideal M-S Contact: FM < FS, p-type semiconductor Band diagram instantly after contact formation: Equilibrium band diagram: Schottky Barrier Height: FBp q. Vbi = FBp– (EF – Ev)FB W EE 130/230 A Fall 2013 Lecture 7, Slide 18 R. F. Pierret, Semiconductor Fundamentals, p. 482
W for p-type Semiconductor p-type semiconductor At x = 0, V = Vbi + VA • W increases with increasing VA • W decreases with increasing NA EE 130/230 A Fall 2013 Lecture 7, Slide 19
Summary EF Ec Ec EF Ev Ec EF EF Ev R. F. Pierret, Semiconductor Fundamentals, p. 481 For rectifying contacts: small-signal capacitance EE 130/230 A Fall 2013 Ev Lecture 7, Slide 20 Ev
Summary: Rectifying Contacts • Schottky barrier height, FB: – Energy barrier that must be surmounted in order for a carrier in the metal to enter the semiconductor • Built-in potential, q. Vbi: FBn-(EC-EF)FB for n-type Si, FBp-(EF-Ev)FB for p-type Si – Ideally q. Vbi is equal to the work function difference between the metal and semiconductor. In practice, for Si: FBn (2/3)EG and FBp (1/3)EG EE 130/230 A Fall 2013 Lecture 7, Slide 21
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