구성 요소 1. Rotary Pump 2. Spin Chamber 3. Spin Controller (WS-400 Process controller)
Vacuum chuck PR 받이 Process Controller
RUN/OFF 표시 Process time Acceleration time Step 현재step/총step Vaccum level 23~25가 정상 RUN 001/003 V=24. 6 B min: sec rpm valu S-02: 30. 0 1000 1030 A-01: 06. 8 1000 0000 Setting value Current value Program
RUN 001/003 V=24. 6 B min: sec rpm valu S-02: 30. 0 1000 1030 A-01: 06. 8 1000 0000 PROGRAMMING VALUE Program Select Program 선택 (A~J) F 1 Progrma 수정 ADD STEP Program step 추가 DEL STEP Program step 제거 STEP 다음 step으로의 이동 ENGTER Program 완료시 CURSOR STEP ADD STEP DEL STEP ENGTER Program Select F 1 VALUE RUN STOP CURSOR VACCUM 값과 커서 이동
조작 방법 • Program 설정 • Wafer loading • Vacuum 설정 • PR dropping (적당량) • RUN • 완료 후, wafer 제거
AZ 1512 PR Coating • Conditions Spin speed : 4000 rpm, 30 sec Soft bake : 95℃, 1 min Exposure : 15 sec Develop : 45 sec ~ 1 min Hard bake : 120 ℃, 3 min
3000 rpm: 1. 6 um 4000 rpm, 1. 3 um
RUN 001/003 V=24. 6 B min: sec rpm valu S-02: 30. 0 1000 1030 A-01: 06. 8 1000 0000 PROGRAMMING VALUE CURSOR STEP PROGRAMMING Program Select VALUE ADD STEP RUN STOP DEL STEP CURSOR STEP ENGTER VACCUM Pro S F 1 ADD STEP RUN STOP DEL STEP ENGTER VACCUM F