Weir PSFM Zspin side analysis II Dataset IntegratedFEMVS

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Weir PSFM Zspin side analysis II Dataset: Integrated_FEM_V_S 4_Modified. csv Features: Focus Dose Matrix

Weir PSFM Zspin side analysis II Dataset: Integrated_FEM_V_S 4_Modified. csv Features: Focus Dose Matrix TEA Systems Corp. 65 Schlossburg St. Alburtis, PA 18011 610 682 4146 TZavecz@TEAsystems. com www. TEAsystems. com March 2005 Weir PSFM/ Zspin March 29, 2005

Zspin, site in field center • X & Y Calibration March 2005 Weir PSFM/

Zspin, site in field center • X & Y Calibration March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 2

Upper left corner • Y slope is a lot noisier. Could be mask or

Upper left corner • Y slope is a lot noisier. Could be mask or Archer March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 3

Offset/ full field (mean offset) March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential

Offset/ full field (mean offset) March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 4

Offset response mean Xreg = March 2005 Yreg + Weir PSFM/ Zspin TEA Systems

Offset response mean Xreg = March 2005 Yreg + Weir PSFM/ Zspin TEA Systems Corp. Confidential 5

Higher-Order Response • Variation from Mean response • Chart (above) shows variation in slope

Higher-Order Response • Variation from Mean response • Chart (above) shows variation in slope as a function of it’s height on field. ? More slope variation in top row March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 6

ZSPIN Principle: Illustration of systematic errors due to patterning 2 nd Exposure: focus sensitive

ZSPIN Principle: Illustration of systematic errors due to patterning 2 nd Exposure: focus sensitive pattern with pinhole offset 1 st Exposure: reference pattern Resulting behavior through focus: offset -D -D 0 +D Black: Individual calibration curve with pinhole aligned Blue and Red: Individual calibration curve with pinhole misalignment Dashed Green: Calibration after combining both calibration March 2005 Weir PSFM/ Zspin curves for any case of misalignment TEA Systems Corp. Confidential +D focus

Calibration (assume it’s the Xleft & Xright data) =Xreg-average offset -D +D focus Simply

Calibration (assume it’s the Xleft & Xright data) =Xreg-average offset -D +D focus Simply subtracting is more sensitive to the metrology errors. =(Xleft – Xright)/2 ONLY <> if there is a mask-hole mialignment March 2005 Better to add in both curves, negate the values of the 2 nd reading and then fit the curve to the result. Weir PSFM/ Zspin TEA Systems Corp. Confidential 8

Plotting “all” points Splitting from: • Local aberration of lens or • Metrology tool

Plotting “all” points Splitting from: • Local aberration of lens or • Metrology tool (Y-axis noise) • Mask-tool stripe error “flat” response from: • Local aberration of lens or • Exposure-tool focus stepping error March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential • Best response analysis is to include all points • They’ll be calibrated out anyway 9

Calibration Summary • Calibration stability • Focus estimation, one sigma, is only (1. 8,

Calibration Summary • Calibration stability • Focus estimation, one sigma, is only (1. 8, 1. 3) uncertainty! Focus & Uncertainty March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 10

Calibration Residuals March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 11

Calibration Residuals March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 11

X & Y Focus response X slit March 2005 Y-Scan Weir PSFM/ Zspin TEA

X & Y Focus response X slit March 2005 Y-Scan Weir PSFM/ Zspin TEA Systems Corp. Confidential 12

Mean Focus response March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 13

Mean Focus response March 2005 Weir PSFM/ Zspin TEA Systems Corp. Confidential 13