Viz Glow Plasma Modeling Software Ver 1 0

Viz. Glow Plasma Modeling Software Ver. 1. 0 (Oct 2009) Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

State-of-the-Art Plasma Software Viz. Glow is a 3 D/2 D/1 D analysis software for the simulation of chemically reactive, non-equilibrium, multi-species, multitemperature plasma discharge phenomena. Viz. Glow is a leading commercial plasma simulation software using the most advanced numerical techniques and software approaches in its development. Viz. Glow is the outcome of over 15 years of research and development experience with plasma simulation software and continues to be vigorously developed and validated based on industrial customer requirements and feedback. Examples of plasma discharges that can be simulated with Viz. Glow: • • • Direct-current, inductive, capacitive, and wave-heated discharges Atmospheric-pressure glow discharges Microdischarges, PDP, lighting plasmas Combustion ignition (spark-plugs, nano-second pulsed, etc. ) Plasma aerodynamic flow actuators Non-equilibrium plasmas in chemical processing Electron density contours in a radio-frequency driven (20 -turn coil) inductively coupled plasma discharge Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

Mesh and Solver Technology Viz. Glow solver supports spatial discretization using unstructured, mixed/hybrid meshes with use of hexahedral, triangular prisms, pyramid, and tetrahedral cells in 3 D, quadrilateral and triangles in 2 D, and stacked line cells in 1 D. Viz. Glow is the only plasma simulation software available today with this technology. Unstructured mixed meshes enable analysis of complex geometric shapes and the resolution of very fine features in these geometries while preserving optimal mesh count. Viz. Glow uses modern linear/non-linear solver techniques and time-stepping approaches to tackle the highly stiff governing equations that characterize plasma models. Examples of plasma discharge geometries with multiple subdomains, hybrid mesh cells and small feature resolution Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

Gas and Surface Chemistry Viz. Glow supports a general-purpose, full-featured, gas-phase and surface chemistry capability. Arbitrarily large finite-rate gas and surface chemical reaction mechanisms with flexible reaction-rate coefficient specifications (Arrhenius, polynomial fits, tables, or general expressions) can be used. Neutral chemistries relevant to combustion and CVD applications and electron-impact and ion chemistries relevant to plasma systems can be implemented readily. The surface chemistry capability supports multiple surface and bulk solid phases, multiple adsorbed species and special reaction types such as sticking reactions and ion-impact sputter yield dependent reactions. The surface chemistry capability is tailored for plasma modeling, but is general enough to be used in catalytic combustion, CVD, corrosion, and pollution control applications. Transient snapshots of important variables in a self-pulsing microdischarge. Self-pulsing behavior depends on E-field dependent secondary electron emission Cross-wafer etch rate prediction in a plasma reactor using a ion-impact etch reaction model Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

Electro-Magnetic Wave Effects Electromagnetic (EM) waves play an important role in power deposition in radio-frequency, inductive, microwave and other wave-heated discharges. Viz. Glow is integrated with an EM wave solver package which provides a complete two-way coupling of plasma and EM wave phenomena. The EM wave solver solves the Maxwell’s equations using either the frequency domain or time domain approach. The EM wave solver determines wave heating effects in conductive solid materials as well as materials with complex conductivities such as the plasma. Eddy current heating owing to magnetic hysteresis loss phenomena is also included. Viz. Glow’s coupled wave simulation feature has been used effectively to predict phenomena in inductively coupled plasma discharges and also for the simulation of standing-wave/skineffect in capacitively coupled discharges. waveguide inlet waveguide termination Real and imaginary components of E-polarized wave in radio-frequency inductive plasma reactor H-polarized microwave (2. 45 GHz) field in an waveguide with L-shaped bend; without and with a conductive obstacle Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

Gas Flow Effects Coupled simulations are achieved by considering the effects of gas flow pressure, temperature, and mass-density fields on the plasma and the effects of gas heating and electro-static/-magnetic forcing on the flow. tim e Viz. Glow features a compressible Navier-Stokes flow solver module that is two-way coupled to the non-equilibrium plasma solver. The gas flow equations are solved on the same mesh datastructure as the plasma equations and therefore presents a unified framework for coupled plasma-fluid flow problems. Gas flow velocity vectors and gas temperature contours in a radio-frequency inductive plasma reactor Pressure blast wave and O radical formation and propagation in a nano-second pulsed plasma combustion ignition of a H 2 -O 2 premixed supersonic stream Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

Outputs for feature-scale simulations Viz. Glow has been used extensively for semiconductor plasma processing equipment simulations. The ultimate goal of most semiconductor plasma equipment simulations is to judge the outcome of the plasma process at the wafer surface. The flux of ion and radical species at wafer surfaces, the impact energy and angle of impact of ions at surfaces, and cross-wafer uniformity of these properties are all important metrics for the plasma process. Validation of modeling with experiments in an industrial capacitively coupled plasma reactor Viz. Glow supports all necessary process (wafer) surface outputs required for feature-scale (topo) simulators, include ion energy distribution functions (IEDF), particle and energy weighted ion angular distribution functions (IADF). These properties are calculated automatically from first principles without any additional user intervention other than the specification of the surface probe points at which these outputs are desired. Ion energy distribution function dependence on wafer location and bias frequency Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

Pre/Post-Processing and User Interface Viz. Glow features a modern Graphical User Interface (GUI) capability which allows for ease in organizing projects and databases, specification of problem inputs, launching of simulations, and post-processing of results. Geometry specification and hybrid unstructured mesh generation is enabled through an internal mesher and also through import of third-party meshes. Post-processing of results can be done through an internal line-plot utility. 2 D and 3 D contour plotting and visualization can be done through third-party software such as Tecplot®. Viz. Glow also outputs results in VTK-format which can be used to visualize results in other open-source visualization software such as Paraview®. Snapshots of the Viz. Glow Graphical User Interface used for organizing projects and databases, specification of problem inputs, launching of simulations, and post-processing of results Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com

Support and Consulting Services Esgee Technologies Inc. provides extensive support to customers as part of the software licensing arrangement. In addition Esgee provides technical consulting services in the use of the Viz. Glow software and more broadly in plasma, fluid flow, and combustion, electromagnetics, other materials processing and related domains. We have worked with numerous customers including semiconductor chip manufacturers, semiconductor equipment manufacturers, solar cell manufacturers, automotive companies, and large high-tech corporations; most of whom are Fortune 500 companies. Esgee possesses a cumulative of over 30 man-years of technical consulting experience. Areas of modeling and simulation expertise: 1) All kind of non-equilibrium plasma discharges (DC, RF, wave-heated), 2) homogeneous combustion and catalytic combustion, 4) materials processing including thermal CVD, PECVD, MOCVD, sputter deposition, etching, and vacuum evaporation processes, 5) direct-simulation Monte-Carlo modeling, for example in vacuum evaporation processes. For further information on Viz. Glow simulation software or technical consulting services please contact: Esgee Technologies Inc. 8201, Cobblestone Austin, Texas 78735, USA Phone: 1 -512 -963 -3813 Email: info@esgeetech. com