Preparation chamber 1 2 3 4 Chamber status

Preparation chamber 1. 2. 3. 4. Chamber status Preparation methods Results: photocurrent, stoichoimetric control Next step

1. Chamber status o o o o o Verdampfer Blendenmodul Laser Control system test Thickness monitor Cathode heating High voltage Shutter Cathode plug

2. Methods Cu-sample Si-wafer Cu-cathode standard 7 1 2 sandwich 0 0 1 co-evaporation 0 1 0

3. Results Photocurrent #05 -05 -31 Vacuum in the experiment #05 -06 -16 Vacuum is not good enough

3. Results Stoichiometric control: Cs/Te ~ 2 Nr Sub. Te thickness Cs/Te PIXE RBS #05 -05 -31 Cu 10 nm 20 nm 0. 55 0. 44 #05 -06 -16 Cu 10 nm 68 nm 1. 9 #05 -06 -22 Si 10 nm 70 nm 1. 6 #05 -06 -23 Co-evap. Si 10 nm 46 nm 0. 8 It is hard to control.

Stoichiometric rate measure 1. PIXE: Cs/Te=0. 55 (calculated by GUPIX, Dr. Grambole) (example: #05 -05 -31 Cs. Te on Cu) 2. RBS: Cs/Te=0. 44 (calculated by XRUMP, Hr. Zhou)

o o photocurrent measurement Photocurrent pulse

4. Next step 1. 2. 3. Chamber cleaning (1010 mbar) Mo cathode polishing (0. 1µm) Clean-room rebuilding Homepage: https: //www. fz-rossendorf. de/projects/CARE/index. htm Logbuch: https: //www. fz-rossendorf. de/pls/rois/elbe. srflogbook. data

Nr substratum Method Te Cs nm nm Cs/Te Photocurr. Vacuum comment mbar #03 -16 -1 Cu standard 30. 3 13. 1 First test #03 -16 -2 Cu standard 10 20. 3 10 -7 No HV #03 -17 Cu standard 12. 3 14. 9 2*10 -7 No HV #03 -18 -1 Cu standard 7. 8 53. 9 0. 1 -0. 7µA 4. 3*10 -7 First photocurrent #03 -23 -2 Cu standard 7. 8 69 0. 4µA 3. 8*10 -7 QE scan inhomogeneous 0. 4µA @2 m. W 2. 5*10 -6 unpolished 1. 2µA @2 m. W 3. 0*10 -6 2. 5*10 -6 Improve sources, polish Cu samples, increase high voltage #05 -05 -31 Cu standard 10 20 0. 5 #05 -06 -03 Cu-cathode standard 10 20 #05 -06 -16 Cu standard 10. 2 68 #05 -06 -22 Si standard 10. 2 70. 4 #05 -06 -23 Si Co-evap. 10. 0 46 #05 -06 -23 c Cu-cathode standard 8 17 0. 3µA @2 m. W #05 -06 -28 Cu-cathode Sandwich 8 50 0. 25µA @2 m. W 1. 9 1µA @1 m. W First test on co-evaporation 2. 5*10 -6

Thickness Quartz thickness monitor STM-1

Co-evaporation #05 -06 -23

RBS for thickness and atom rate