OXIDATION DealGrove Model oxidation mechanism model oxidation reaction
- Slides: 17
OXIDATION(산화공정) § Deal-Grove Model은 oxidation mechanism을 설명하는 model로써, oxidation reaction은 oxide/ambient gas interface 보다는 oxide/substrate interface 에서 일어난다고 가정하고, 다음 3가지 현상들에 의해 일어난다. ① Ambient gas에서 Oxide표면으로의 확산 : F 1 Boundary/Stagnant Layer Oxide Substrate δs ② Oxide Layer를 통해 oxide/substrate interface로의 확산 : F 2 ③ Substrate과 반응 : F 3 -6 - 과학기술부 국가지정연구실 National Research Lab. 6
OXIDATION(산화공정) -7 - 과학기술부 국가지정연구실 National Research Lab. 7
OXIDATION(산화공정) 유기물 제거 NATIVE OXIDE 제거 -9 - 과학기술부 국가지정연구실 National Research Lab. 9
OXIDATION(산화공정) 2. Wafer crystal orientation(〔 111〕, 〔 100〕) Si Si a 〔 111〕, 〔 100〕wafer의 원자밀도 비교 Si Si 〔 100〕 Si Si √ 2 a Si 단위면적 = S 단위면적당 Si원자 개수 (원자밀도)=U S 100 = a 2 U 100 = 2/a 2 S 111 = ½ x (√ 2 a)2 x √ 3/2 = √ 3/2 a 2 U 111 = 2/√ 3(2/a 2) 〔 111〕 U 111 > U 100 - 11 - 과학기술부 국가지정연구실 National Research Lab. 11
OXIDATION(산화공정) Atomic Force Microscopy Laser • Schematic of AFM Photodiode Piezo Cantilever Feedback and x, y, z Scan Control Sample x, y, z Scanner Display - 14 - (CD-ROM) 과학기술부 국가지정연구실 National Research Lab. 14
OXIDATION(산화공정) Atomic Force Microscopy • Interatomic force vs. distance curve. - 15 - 과학기술부 국가지정연구실 National Research Lab. 15
OXIDATION(산화공정) SPM Operation Modes Contact Mode Provide atomic resolution in air Destructive method for soft sample DFM(Dynamic Force Mode) <Intermittent Mode> <Non-Contact Mode> Nondestructive method for soft sample Suitable mode for the rough and sticky surface - 16 - 과학기술부 국가지정연구실 National Research Lab. 16
OXIDATION(산화공정) ITO (Contact mode) Pattern image-3 D (Contact mode) OTFT (Non-contact mode) Charging image-3 D (Non-contact mode) Positive charge Negative charge - 17 - 과학기술부 국가지정연구실 National Research Lab. 17
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