North America Microlithography Technical Committee Chapter Liaison Report

North America Microlithography Technical Committee Chapter Liaison Report Jan. 2016

Meeting Information • Last meeting – SEMICON West – July 14, 2015 • San Francisco Marriott Marquis Hotel • Next meeting – SPIE Advanced Lithography Conference – San Jose, CA – Wednesday, February 24, 2016 • 6: 00 PM to 8: 00 PM NA Microlithography Report - Jan 2016

Task Force and Leadership Changes • Task Force Change – Standards for Scatterometry Task Force was disbanded. • Leadership Changes – Rick Silver (NIST) stepped down as TC Chapter cochair. – Bryan Barnes (NIST) was appointed as TC Chapter cochair serving with Wes Erck (Wes Erck & Associates). NA Microlithography Report - Jan 2016

Leadership • N. A. Microlithography TC Chapter Cochairs – Wes Erck / Wes Erck & Associates – Bryan Barnes / NIST NA Microlithography Report - Jan 2016

Microlithography TC Chapter Structure NA Microlithography Report - Jan 2016

Ballot Review Summary • None. NA Microlithography Report - Jan 2016

New SNARFs • Doc. 5906 - Line Item Revision to SEMI P 39, OASISTM - Open Artwork System Interchange Standard (To correct nonconforming title) • Doc. 5907 - Revision to SEMI P 5 -0704 Specification for Pellicles • Doc. 5908 - Reapproval for SEMI P 40 -1109 Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks • Doc. 5909 - Reapproval for SEMI P 48 -1110 Specification of Fiducial Marks for EUV Mask Blank NA Microlithography Report - Jan 2016

Ballots issued for cycle 9 -15 • Doc. 5907 - Revision to SEMI P 5 -0704 Specification for Pellicles • Doc. 5908 - Reapproval for SEMI P 40 -1109 Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks • Doc. 5909 - Reapproval for SEMI P 48 -1110 Specification of Fiducial Marks for EUV Mask Blank NA Microlithography Report - Jan 2016

Ballots issued for cycle 1 -16 • Doc. 5906 - Line Item Revision to SEMI P 39, OASIS® - Open Artwork System Interchange Standard (To correct nonconforming title) NA Microlithography Report - Jan 2016

SNARFs Discontinued • Revision of SEMI P 10 -1112, Specification of Data Structures for Photomask Orders (SNARF # 5561) – No additional document development activity planned. • Reapproval of SEMI P 35 -1106, Terminology for Microlithography Metrology (SNARF # 5145) – SEMI P 35 was reapproved via the Japan Micropatterning TC Chapter in spring 2013. • Revision to SEMI P 25 -94 (Reapproved 1104), Specification for Measuring Depth of Focus and Best Focus (SNARF # 5271) – SEMI P 25 has already been moved into Inactive status. NA Microlithography Report - Jan 2016

Inactive Standard • The NA Microlithography Technical Committee Chapter agreed to allow P 10 to go into Inactive Status. – SEMI P 10 (Specification of Data Structures for Photomask Orders) NA Microlithography Report - Jan 2016

Standards will go into Inactive status [1/3] • Feedback Requested on NA Microlithography TC Chapter-Originated Standards to go into Inactive Status. • If no inputs are received, these Standards will go into Inactive status. • See next two slides for full list NA Microlithography Report - Jan 2016

Standards will go into Inactive status. [2/3] • • P 1 -0708 E, Specification for Hard Surface Photomask Substrates P 2 -0308, Specification for Chrome Thin Films for Hard Surface Photomasks P 3 -0308, Specification for Photoresist/E-Beam Resist for Hard Surface Photoplates P 6 -88 (Reapproved 0707), Specification for Registration Marks for Photomasks P 12 -0997, Determination of Iron, Zinc, Calcium, Magnesium, Copper, Boron, Aluminum, Chromium, Manganese, and Nickel in Positive Photoresists by Inductively Coupled Plasma Emission Spectroscopy (ICP) P 13 -91 (Reapproved 1104), Determination of Sodium and Potassium in Positive Photoresists by Atomic Absorption Spectroscopy P 14 -0997, Determination of Tin in Positive Photoresists by Graphite Furnace Atomic Absorption Spectroscopy P 15 -92 (Reapproved 1104), Determination of Sodium and Potassium in Positive Photoresist Metal Ion Free (MIF) Developers by Atomic Absorption Spectroscopy NA Microlithography Report - Jan 2016

Standards will go into Inactive status. [3/3] • • P 16 -92 (Reapproved 1104), Determination of Tin in Positive Photoresist Metal Ion Free (MIF) Developers by Graphite Furnace Atomic Absorption Spectroscopy P 17 -92 (Reapproved 0299), Determination of Iron, Zinc, Calcium, Magnesium, Copper, Boron, Aluminum, Chromium, Manganese, and Nickel in Positive Photoresist Metal Ion Free (MIF) Developers by Inductively Coupled Plasma Emission Spectroscopy (ICP) P 18 -92 (Reapproved 1104), Specification for Overlay Capabilities of Wafer Steppers P 19 -92 (Reapproved 0707), Specification for Metrology Pattern Cells for Integrated Circuit Manufacture P 24 -94 (Reapproved 1104), CD Metrology Procedures P 28 -96 (Reapproved 0707), Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture P 34 -0200 (Reapproved 0707), Specification for 230 mm Square Photomask Substrates P 45 -0211, Specification for Job Deck Data Format for Mask Tools NA Microlithography Report - Jan 2016

Data Path TF • Open Artwork Systems Interchange Standard (OASIS®) is widely used in the semiconductor industry • No plan to materially change SEMI P 39 NA Microlithography Report - Jan 2016

Extreme Ultraviolet (EUV) TF • Doc. 5907, Revision to SEMI P 5 -0704, Specification for Pellicles – The proposed change is to bring the standard up to date to include EUV pellicles. Paragraphs which will require changes are • • 2 Scope 4. 1. 2. 2 Exposure Wavelength, 4. 1. 2. 3 Optical Transmission, 4. 1. 2. 4 Thickness 4. 1. 2. 5 Mechanical Strength 5. 2 Frame Adhesive 5. 4 Light resistance – Ballot will be reviewed at the next meeting NA Microlithography Report - Jan 2016

Mask Orders (P 10) TF • Plans to add a new syntax to support both “pre-order” and Foundry order mask making instructions though no progress has been made. • No other activity is foreseen on P 10 unless something comes up. NA Microlithography Report - Jan 2016

Terminology TF • No activity. • Will determine whether to disband the task force at the next meeting. NA Microlithography Report - Jan 2016

Extreme Ultraviolet (EUV) Fiducial Mark TF • No update NA Microlithography Report - Jan 2016

Thank You! For more information or to participate in any N. A. Microlithography activities, please contact Kevin Nguyen at SEMI (knguyen@semi. org) NA Microlithography Report - Jan 2016