Nanolitografi Ebeam litografi Nano imprint litografi Mikroskopi SEM
Nanolitografi E-beam litografi Nano imprint litografi
Mikroskopi
SEM (scanning electron microscope)
Komponenter i SEM Schottky emitter elektronkilde F =-e v x B Magnetisk linse
E-beam litografi - Dedikerede e-beam systemer - SEM med Raith Gmbh kontrolsystem og ’pattern generator’ DANCHIP
Test of nanowire writing E-beam writing+RIE (Nano 9 – Tom+Jeppe)
Wires and channels
Optiske strukturer Diffraktive komponenter 2 D grating: Periodicity - 250 nm
Nano Imprint Lithography (NIL)
Nanowire detektor Appl. Phys. Lett. 89, 153102 (2006)
Focused Ion Beam (FIB) System
Focused Ion Beam Writing As the diagram on the right shows, the gallium (Ga+) primary ion beam hits the sample surface and sputters a small amount of material, which leaves the surface as either secondary ions (i+ or i-) or neutral atoms (n 0). The primary beam also produces secondary electrons (e-). As the primary beam rasters on the sample surface, the signal from the sputtered ions or secondary electrons is collected to form an image.
E-beam og FIB litografi • E-beam ~10 nm • FIB ~20 nm • EDX
TEM samples
FIB skrivning AAU-logo på et hår
CVD med FIB stråle Shinji MATSUI
http: //www. nanonet. go. jp/english/mailmag/2 006/086 a. html
http: //www. nanonet. go. jp/english/mailmag/2 006/086 a. html
http: //www. nanonet. go. jp/english/mailmag/2 006/086 a. html
http: //www. nanonet. go. jp/english/mailmag/2 006/086 a. html
http: //www. nanonet. go. jp/english/mailmag/2 006/086 a. html
FIB skrivning AAU-logo på et hår
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