MOS SourceDrain Photomask dark field Chromium Cross Section

铝栅MOS 艺掩膜版的说明 • Source/Drain: Photomask (dark field) Chromium Cross Section Clear Glass

• Gate: Photomask (dark field) Chromium Cross Section Clear Glass

• Contacts: Photomask (dark field) Chromium Cross Section Clear Glass

• Metal Interconnects: Photomask (light field) Clear Glass Cross Section Chromium

Process (2)刻多晶硅与自对准掺杂 Self-Align Doping

Process (3)刻接触孔、反刻铝 field oxide (FOX) metal-poly insulator thin oxide

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4. 刻PMOS管S、D 5. 刻NMOS管S、D

6. 刻接触孔 7. 反刻Al VDD Vi Vo Vss

光刻 5与光刻 6套刻 光刻 6与光刻 7套刻 VDD Vi Vo Vss VDD Vi Vi Vi Vo Vss VDD DD V Vo Vss

Poly Diff VDD Al con P阱 T 2 W/L=3/1 Vi Vo T 1 W/L=1/1 Vss