MEMS CLEAN ROOM n 1500 m 2 class

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MEMS CLEAN ROOM n 1500 m 2, class 10 n 150 mm (6”) Wafer

MEMS CLEAN ROOM n 1500 m 2, class 10 n 150 mm (6”) Wafer line n 3 shift preparation for R&D and pilot fabrication (24 x 5) n Access to external services n Technological parameter supervising system n MES / PPS based planning and documentation n ISO 9001 certification © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 1

MEMS Clean Room Layout Aktuelle Clusterung SEM BACK END CHARACTERIZATION & TEST WET ETCH

MEMS Clean Room Layout Aktuelle Clusterung SEM BACK END CHARACTERIZATION & TEST WET ETCH / CLEANING LAB INLINE METROLOGY BACK END CVD LOGISTICS HIGH TEMPERATURE EXTERNAL PARTNERS LITHOGRAPHY DRY ETCH / PVD GOWNING AREA CMP © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 2

MEMS Clean Room: Characterization & Test © Fraunhofer IPMS T. Zarbock I 05. 04.

MEMS Clean Room: Characterization & Test © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 3

MEMS Clean Room: Lithography © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I

MEMS Clean Room: Lithography © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 4

MEMS Clean Room: Wet Etch / Cleaning © Fraunhofer IPMS T. Zarbock I 05.

MEMS Clean Room: Wet Etch / Cleaning © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 5

MEMS Clean Room: Wet Etch / Cleaning © Fraunhofer IPMS T. Zarbock I 05.

MEMS Clean Room: Wet Etch / Cleaning © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 6

MEMS Clean Room: Dry Etch / Strip Resist © Fraunhofer IPMS T. Zarbock I

MEMS Clean Room: Dry Etch / Strip Resist © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 7

MEMS Clean Room: Backend (Bonding, Dispense) © Fraunhofer IPMS T. Zarbock I 05. 04.

MEMS Clean Room: Backend (Bonding, Dispense) © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 8

MEMS Clean Room: Inline Metrology © Fraunhofer IPMS T. Zarbock I 05. 04. 2013

MEMS Clean Room: Inline Metrology © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 9

MEMS Clean Room: Inline Metrology © Fraunhofer IPMS T. Zarbock I 05. 04. 2013

MEMS Clean Room: Inline Metrology © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 10

MEMS Clean Room: SEM © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I

MEMS Clean Room: SEM © Fraunhofer IPMS T. Zarbock I 05. 04. 2013 I slide 11

CHULA VISTA CLEAN Clean Air Clean Water CleanCHULA VISTA CLEAN Clean Air Clean Water Clean
CHULA VISTA CLEAN Clean Air Clean Water CleanCHULA VISTA CLEAN Clean Air Clean Water Clean
System Specification Clean Room Clean Room Area 11System Specification Clean Room Clean Room Area 11
Overview of clean room facilities and clean roomOverview of clean room facilities and clean room
5192021 4 System Specification Clean Room Clean Room5192021 4 System Specification Clean Room Clean Room
1202022 4 System Specification Clean Room Clean Room1202022 4 System Specification Clean Room Clean Room
Room Five Room Two Room Four Room ThreeRoom Five Room Two Room Four Room Three
Room Five Room Two Room Four Room ThreeRoom Five Room Two Room Four Room Three
Room Two Room Four Room Three Room OneRoom Two Room Four Room Three Room One
MEMS Class 4 Fabrication Processes for MEMS MohammadMEMS Class 4 Fabrication Processes for MEMS Mohammad