DEMONSTRATION OF 22 NM HALFPITCH RESOLUTION AT THE

Introduction EIPBN 2015, San Diego 2 Yan, Proc. of SPIE 9422, 94220 J (2015)

Overview 3 EIPBN 2015, San Diego Source: Synchrotron Optics: Zoneplate lenses 4×NA: 0. 25–

SHARP 4 EIPBN 2015, San Diego Layout CCD R TO INA UM ILL LENS

SHARP EIPBN 2015, San Diego SRI 2013 5 4

Fourier Synthesis Illuminator Pupil fill § Annuluar s 1=0. 2 s 2=0. 8 §

Fourier Synthesis Illuminator Pupil fill § Crosspole s 1=0. 4 s 2=0. 8 §

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO ASML Flex pupil

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Optimized source Liu,

Fourier Synthesis Illuminator Pupil fill § Pixelated Source § 0. 5 4 x. NA

Fourier Synthesis Illuminator Pupil fill § Intensity Modulation § Pixelated Source § 0. 5

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Pupil channel a

Fourier Synthesis Illuminator 9 EIPBN 2015, San Diego Source Optimization and SMO Pupil channel

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Pupil 9

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Pupil Image 9

SHARP 2013 EUVL Symposium, Toyama, Japan 5 Zoneplates § Gold pattern on Si-membranes §

SHARP 10 EIPBN 2015, San Diego Zoneplates Chip A Standard Zoneplates: § 0. 25

SHARP EIPBN 2015, San Diego Zoneplates 0. 33 -NA scanner § 4 x demagnification

SHARP EIPBN 2015, San Diego Zoneplates 0. 5 -NA scanner § 4 x demagnification

SHARP EIPBN 2015, San Diego Zoneplates Potential higher-NA at 4 x demagnification SHARP §

SHARP EIPBN 2015, San Diego 11 Zoneplates Potential higher-NA at 4 x demagnification SHARP

SHARP EIPBN 2015, San Diego 11 Zoneplates 0. 5 -NA scanner § 4 x

SHARP EIPBN 2015, San Diego 11 Zoneplates 0. 55 -NA scanner with anamorphic optics

12 EIPBN 2015, San Diego Resolution Test Target Resolution Limits Illumination coherent Rayleigh incoherent

Resolution Test Target EIPBN 2015, San Diego 13 MET 3 Photoresist Berkeley Microfield Exposure

Resolution Test Target SEM images § 28 -nm hp lines § bright field §

Results 0. 5 4 x. NA § Coherent illumination 100 -nm hp lines EIPBN

Results 0. 5 4 x. NA § Coherent illumination § r. C=54 nm hp

Results 0. 5 4 x. NA § Incoherent illumination § r. R=33 nm hp

Results 0. 5 4 x. NA § Extreme dipole § r. D=27 nm hp

Results 0. 625 4 x. NA § Coherent illumination § r. C=44 nm hp

Results 0. 625 4 x. NA § Incoherent illumination § r. R=26 nm hp

Results 0. 625 4 x. NA § Extreme dipole § r. L=22 nm hp

EIPBN 2015, San Diego Summary Semiconductor High-NA Actinic Reticle Review Project § Fourier Synthesis

EIPBN 2015, San Diego sharp. lbl. gov Thank you!

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DEMONSTRATION OF 22 -NM HALF-PITCH RESOLUTION AT THE SHARP MICROSCOPE Semiconductor High-NA actinic Reticle Review Project Markus Benk, Ken Goldberg, Antoine Wojdyla, Chris Anderson, Mike Kocsis, Patrick Naulleau EIPBN 2015, San Diego, May 28

Introduction EIPBN 2015, San Diego 2 Yan, Proc. of SPIE 9422, 94220 J (2015) Raghunathan, J. Vac. Sci. Technol. B 32(6) (2014) Mangat, PMJ 2015 (in press) Lawliss, Proc. of SPIE 923516 (2014)

Overview 3 EIPBN 2015, San Diego Source: Synchrotron Optics: Zoneplate lenses 4×NA: 0. 25– 0. 625 Sigma: Programmable Navigation: Full-mask XY

SHARP 4 EIPBN 2015, San Diego Layout CCD R TO INA UM ILL LENS PHOTOMASK Not to scale

SHARP EIPBN 2015, San Diego SRI 2013 5 4

Fourier Synthesis Illuminator Pupil fill § Annuluar s 1=0. 2 s 2=0. 8 § 0. 5 4 x. NA 8° CRA EIPBN 2015, San Diego 6

Fourier Synthesis Illuminator Pupil fill § Crosspole s 1=0. 4 s 2=0. 8 § 0. 5 4 x. NA 8° CRA EIPBN 2015, San Diego 6

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO ASML Flex pupil § 7 standard fills Liu, Proc. of SPIE 90480 Q (2014) Meiling, Proc. of SPIE 8322, 83221 G (2012) 7

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Optimized source Liu, Proc. of SPIE 90480 Q (2014) Meiling, Proc. of SPIE 8322, 83221 G (2012) 7

Fourier Synthesis Illuminator Pupil fill § Pixelated Source § 0. 5 4 x. NA 8° CRA EIPBN 2015, San Diego 8

Fourier Synthesis Illuminator Pupil fill § Intensity Modulation § Pixelated Source § 0. 5 4 x. NA 8° CRA EIPBN 2015, San Diego 8

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Pupil channel a 9

Fourier Synthesis Illuminator 9 EIPBN 2015, San Diego Source Optimization and SMO Pupil channel a Image

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Pupil 9

Fourier Synthesis Illuminator EIPBN 2015, San Diego Source Optimization and SMO Pupil Image 9

SHARP 2013 EUVL Symposium, Toyama, Japan 5 Zoneplates § Gold pattern on Si-membranes § Magnetic mounting § Kinematic positioning 2 5 mm

SHARP 10 EIPBN 2015, San Diego Zoneplates Chip A Standard Zoneplates: § 0. 25 to 0. 625 4 x. NA § 6° to 10° CRA § 5 azimuthal angles 160 µm Chip B § Zernike Phase Contrast § Differential Interference Contrast § Stereoscopic imaging § Cubic Phase Modulation Chip C (coming soon) § Vari-NA zoneplates § Hybrid focus § Hybrid DIC X/Y § Hybrid bright- / dark field § Programmed aberrations

SHARP EIPBN 2015, San Diego Zoneplates 0. 33 -NA scanner § 4 x demagnification § 0. 0825 mask-side NA SHARP § 0. 0825 NA zoneplate § 6º central ray angle SHARP off-axis zoneplate 11

SHARP EIPBN 2015, San Diego Zoneplates 0. 5 -NA scanner § 4 x demagnification § 0. 125 mask-side NA SHARP § 0. 125 NA zoneplate § 8º central ray angle SHARP off-axis zoneplate 11

SHARP EIPBN 2015, San Diego Zoneplates Potential higher-NA at 4 x demagnification SHARP § 0. 156 NA zoneplate § 10º central ray angle SHARP off-axis zoneplate 11

SHARP EIPBN 2015, San Diego 11 Zoneplates Potential higher-NA at 4 x demagnification SHARP § 0. 156 NA zoneplate § 10º central ray angle § 11º SHARP off-axis zoneplate

SHARP EIPBN 2015, San Diego 11 Zoneplates 0. 5 -NA scanner § 4 x demagnification § 0. 125 mask-side NA SHARP § 0. 125 NA zoneplate § 8º central ray angle § 11º SHARP off-axis zoneplate

SHARP EIPBN 2015, San Diego 11 Zoneplates 0. 55 -NA scanner with anamorphic optics § 6º central ray angle § 4 x demagnification in x and 8 x in y § 0. 138 mask-side NA in x and 0. 069 in y § 11º SHARP off-axis zoneplate

12 EIPBN 2015, San Diego Resolution Test Target Resolution Limits Illumination coherent Rayleigh incoherent dipole extreme dipole zoneplate Resolution limit 0. 125 NA (0. 54 x. NA NA 0. 5 scanner) 108 54 0. 156 NA 0. 625 (0. 6254 x. NA NA scanner) 87 87 44 44 54 66 66 33 54 (pitch) pitch 54 27 hp 33 27 (half pitch) 5353 44 44(pitch) pitch 2626 22(half hp 22 pitch)

Resolution Test Target EIPBN 2015, San Diego 13 MET 3 Photoresist Berkeley Microfield Exposure Tool § 0. 3 NA Inpria YA-Series Resist § Negative-tone § 50 -nm absorption length § 30 -nm thick resist on Si-wafer coated with a standard Mo/Si-multilayer § 30% EUV-transmission on double pass

Resolution Test Target SEM images § 28 -nm hp lines § bright field § 22 -nm hp lines § dark field EIPBN 2015, San Diego 14

Results 0. 5 4 x. NA § Coherent illumination 100 -nm hp lines EIPBN 2015, San Diego 2 µm 15

Results 0. 5 4 x. NA § Coherent illumination § r. C=54 nm hp CD 100 -nm hp lines § 83% modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 5 4 x. NA § Coherent illumination § r. C=54 nm hp CD 60 -nm hp lines § 68% modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 5 4 x. NA § Coherent illumination § r. C=54 nm hp CD 50 -nm hp lines § No modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 5 4 x. NA § Incoherent illumination § r. R=33 nm hp CD 50 -nm hp lines § 20% modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 5 4 x. NA § Incoherent illumination § r. R=33 nm hp CD 36 -nm hp lines § 5% modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 5 4 x. NA § Incoherent illumination § r. R=33 nm hp CD 34 -nm hp lines § 4% modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 5 4 x. NA § Extreme dipole § r. D=27 nm hp CD 34 -nm hp lines § 27% modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 5 4 x. NA § Extreme dipole § r. D=27 nm hp CD 28 -nm hp lines § 14% modulation EIPBN 2015, San Diego 300 nm 16

Results 0. 625 4 x. NA § Coherent illumination § r. C=44 nm hp CD 100 -nm hp lines § 83% modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Coherent illumination § r. C=44 nm hp CD 50 -nm hp lines § 56% modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Coherent illumination § r. C=44 nm hp CD 40 -nm hp lines § No modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Incoherent illumination § r. R=26 nm hp CD 40 -nm hp lines § 18% modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Incoherent illumination § r. R=26 nm hp CD 28 -nm hp lines § 3% modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Incoherent illumination § r. R=26 nm hp CD 26 -nm hp lines § 2% modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Extreme dipole § r. L=22 nm hp CD 26 -nm hp lines § 33% modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Extreme dipole § r. L=22 nm hp CD 24 -nm hp lines § 25% modulation EIPBN 2015, San Diego 200 nm 17

Results 0. 625 4 x. NA § Extreme dipole § r. L=22 nm hp CD 22 -nm hp lines § 10% modulation EIPBN 2015, San Diego 200 nm 17

EIPBN 2015, San Diego Summary Semiconductor High-NA Actinic Reticle Review Project § Fourier Synthesis Illuminator produces arbitrary sources § Emulation of anamorphic imaging § 22 -nm half-pitch resolution The project was funded by SEMATECH through the U. S. Department of Energy under Contract No. DE-AC 02 -05 CH 11231

EIPBN 2015, San Diego sharp. lbl. gov Thank you!