CMP Advanced CMP Seminar April 152014 13 3017

先進化學機械平坦化(CMP)研討會 Advanced CMP Seminar April 15/2014, 13: 30~17: 30 台北市基隆路四段 43號台灣科技大學 International Building RM 202 樹立國際產學合作典範，為台 灣半導體開創新局面的一步 開拓化學機械平坦化前進領域 CMP是半導體相當關鍵之製程，它的訴求 極為嚴苛，而且尺度只會愈來愈緊。昔日 不可行之困難，於今則為必備條件。開拓 先進CMP技術與應用需要巨大的資源與財 力，而又是不可避免之趨勢。 研究機構、學術界、廠商、終端使用者能 否群策群力，有效運用既有的資源，以達 成期望之成果？ 本研討會將從技術、市場、商業合作模式 等方向探討CMP重要議題。 講員來自日本、歐盟、台灣—全球IC業的 關鍵區域，在相關產業有20年以上經驗， 分享他們對CMP研發落實的觀點。 主辦單位 Organizer 國立台灣科技大學 晶圓平坦化創新中心 Establishing international industry-academy collaboration model, forwarding a critical step for Taiwan semiconductor industry. Exploring Frontiers of CMP, one of critical processes in IC fabrication, is being more stringent and demanding. What was impossible yesterday now is must-be. To explore advanced technologies and applications requires tremendous resources, and formidable cost, but unavoidable. How can research institutes, academies, suppliers, and end-users be linked together, with collective effort, optimizing limited resources, to achieve what is necessary? This seminar will shed light on CMP issues in various respects: technology, marketing, and business collaborating model. Speakers from Japan, Europe, Taiwan—key regions of IC industry, having experience in related industry over 20 years, will share their perspectives of R & D realization. 協辦單位 Co-organizer 台灣平坦化應用技術協會

13: 15 13: 30 Sign in 13: 30 13: 40 Opening: Dr. C. J. Liao, President, Taiwan Tech 13: 40 13: 50 Topic 1: Introduction on CIC Dr. C. C. Chen, Distinguished Professor, Director of CMP Innovation Center, Taiwan Tech 13: 50 14: 30 Topic 2: Now's the time, the R&D on CMP in Taiwan Dr. K. Kimura, Professor, Taiwan Tech 14: 30 15: 20 Topic 3: Paradigm Shift in Semiconductor World Dr. M. Tsujimura, President of Precision Machinery Company, Ebara Corp 15: 20 15: 50 Break 15: 50 16: 30 Topic 4: Collaborative Research : The Impact of International Partnerships Peter Lemmens, General Manager, IMEC Taiwan 16: 30 17: 10 Topic 5: Taking the rough and yielding the smooth Dr. LC Kong, General Secretary, CMPUGTW 17: 10 17: 30 Open discussion