Chap 9 Photolithography 13 Photolithography Vapor Prime to

Chap 9. Photolithography

13. Photolithography (Vapor Prime to Soft Bake)

13. Photolithography (Vapor Prime to Soft Bake) PL Optical PL Resolution Light source alignment Negative Positive

13. Photolithography (Vapor Prime to Soft Bake) steps priming Hexamethyldisilaxone

13. Photolithography (Vapor Prime to Soft Bake) PR properties Resin Sensitizer solvent Spin coating steps Solvent dive-off adhesion

14. Photolithography (Alignment & Exposure)

14. Photolithography (Alignment & Exposure) Stepper Step-and-scan UV DUV EUV

14. Photolithography (Alignment and Exposure) Lens Mirror Larger NA Formula for R DOF Planar surface

14. Photolithography (Alignment & Exposure) Contact aligner proximity Scanner Stepper Step-and-scan

14. Photolithography (Alignment & Exposure) Reticle Reduction ratio PSM

Phase shift mask (PSM)

15. Photolithography (PR Development & Advanced)

15. Photolithography (PR Development & Advanced) PEB Acid-catalyzed develop TMAH Tetramethyl ammounium hydroxide

15. Photolithography (PR Development & Advanced) NGL EUV

15. Photolithography (PR Development & Advanced) EUV 13 nm, mirror EBL IPL XPL mask

Comparison of NGL technologies

Wavelength of lithographic tools

EUV lithography system