Chap 10 Etching and implantation Wet etching Etching

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Chap 10. Etching and implantation

Chap 10. Etching and implantation

Wet etching

Wet etching

Etching gas

Etching gas

Wet etching

Wet etching

16. Etch

16. Etch

Plasma enhanced chemical etching e- + Bulk Plasma e- + + + e- mask

Plasma enhanced chemical etching e- + Bulk Plasma e- + + + e- mask (mask erosion) + volatile product Sheath sidewall passivation + + reactive ion reactive species e- electron PR particle + λD ~ <1 mm e- Substrate e- e- Electrode e- e- x eplasma presheath Sheath 0 edge s

16. Etch Dry etch Wet etch Etch bias selectivity

16. Etch Dry etch Wet etch Etch bias selectivity

16. Etch Poor selectivity EPD RIE HDP etcher

16. Etch Poor selectivity EPD RIE HDP etcher

16. Etch ECR ICP DPS MERIE EPD FC chemistry For oxide F > Cl

16. Etch ECR ICP DPS MERIE EPD FC chemistry For oxide F > Cl > Br based For Silicon

Various Plasma Etching Reactors Schematic configuration of several dry etching reactors; (a) chemically assisted

Various Plasma Etching Reactors Schematic configuration of several dry etching reactors; (a) chemically assisted ion beam etching (CAIBE) reactor, (b) reactive ion etching (RIE) chamber, (c) inductively coupled plasma (ICP) reactor, (d) electron cyclotron resonance (ECR) reactor.

16. Etch Cl based For metal Ashing oxygen

16. Etch Cl based For metal Ashing oxygen

17. Ion Implant doping Diffusion implanation

17. Ion Implant doping Diffusion implanation

17. Ion Implant Predeposition Drive-in activation physical dose Concentration

17. Ion Implant Predeposition Drive-in activation physical dose Concentration

17. Ion Implant

17. Ion Implant

17. Ion Implant Thermal Anneal RTA Channeling

17. Ion Implant Thermal Anneal RTA Channeling

17. Ion Implant SOI SIMOX

17. Ion Implant SOI SIMOX

SOI wafer DBW Direct Bonded Wafer Si Wafer SIMOX Separation by Implantation Oxygen Implantation

SOI wafer DBW Direct Bonded Wafer Si Wafer SIMOX Separation by Implantation Oxygen Implantation Thermal Oxidation ; Si. O 2 Layer Bonding Si Wafer Heat Treatment Thinning of Si Layer Si Wafer Si. O 2 Layer

Chap 10 Etching and implantation Wet etching EtchingChap 10 Etching and implantation Wet etching Etching
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IMPLANTATION Implantation is a process in which aIMPLANTATION Implantation is a process in which a
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36 th seminar Chap 1 Chap 2 Chap36 th seminar Chap 1 Chap 2 Chap
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