Basic of Plasmas Discharges 1 2 CCP ICP

Basic of Plasmas & Discharges 이민형

1. 플라즈마란? 2. 플라즈마의 발생 원리 (CCP, ICP) Collisional Heating, Collisionless Heating 3. 플라즈마는 어떻게 에너지를 잃는가? 4. CCP & ICP & ECR Chamber

플라즈마(PLASMA) 란? 중성종 (neutral species) 양이온 (positive ion) 전자 (electron ) 플라즈마 (PLASMA)

CCP (Capacitively Coupled Plasmas) Collisional Heating of Electrons

CCP (Capacitively Coupled Plasmas) Collisional Heating of Electrons 가속 (gain energy)

CCP (Capacitively Coupled Plasmas) Collisional Heating of Electrons can’t gain energy from electric field without collisions with neutral species.

CCP (Capacitively Coupled Plasmas) Collisional Heating of Electrons can gain energy from electric field with collisions with neutral species. Collisional Heating

ICP (Inductively Coupled Plasmas) Collisional Heating of Electrons 자기장 전기장 유도 전기장

ICP (Inductively Coupled Plasmas) Collisional Heating of Electrons can’t gain energy from electric field without collisions with neutral species.

ICP (Inductively Coupled Plasmas) Collisional Heating of Electrons gain energy from electric field with collisions with neutral species. Collisional Heating

Collisionless Heating in CCP W V V+2 W

Electron Heating 전자가 플라즈마 챔버에서 에너지를 얻는 과 정 1. Collisional Heating (Ohmic heating) 전기장 + 중성종과의 충돌 2. Collisionless Heating (Stochastic heating) 전자가 진동하는 쉬스(sheath)에 충돌 낮은 압력 (수 m. Torr) : Collisionless heating > Collisional heating 높은압력 (> 수십 m. Torr) : Collisional heating > Collisionless heating

전자 에너지 분포 (Electron energy distribution EED) 전자온도 Te = 2. 0 e. V 전자 에너지 (Energy of electrons, e. V) 전자온도 =

전자 에너지 분포 (Electron energy distribution EED) 전자 에너지 분포 Te = 2. 0 e. V Te = 4. 0 e. V Te = 6. 0 e. V 전자 에너지 (Energy of electrons, e. V)

4. CCP & ICP & ECR Chamber

ICP (Inductively Coupled Plasmas) Chamber Cylindrical type Planar type

Ferrite ICP Chamber u Ferrite core를 이용하여 기존 ICP보다 더 높은 플라즈마 밀도를 얻을 수 있다. Kyeonghyo Lee, Youngkwang Lee, Sungwon Jo, Chin-Wook Chung and Valery Godyak, Plasma Sources Sci. Technol. 17, 015014 (2008)

ECR (Electron Cyclotron Resonance) Chamber Microwave (2. 45 GHz) 전자 heating 지역 (Zone) DC 자기장 (~ 875 G)

ECR (Electron Cyclotron Resonance) Chamber HWP ECR : Electron Cyclotron Resonance HWP : Helicon Wave Plasma ICP : Inductively Coupled Plasma CCP : Capacitively Coupled Plasma ECR ICP CCP Phys. Plasmas, vol. 10, 323 (2003)