Agilent 7500 ICPMS Date 28 JUL 2005 What

Agilent 7500 ICP-MS Date: 28 JUL 2005

What is ICP-MS? 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 1 H 2 Li Be B C N O 3 Na Mg Al Si P 4 K Ca Sc Ti V Cr Mn Fe Co Ni Cu Zn Ga Ge 5 Rb St Y Zr Nb Mo Tc Ru Rh Pd Ag Cd In 6 Cs Ba L Hf Ta W Re Os Ir Pt Au Hg Tl 7 Fr Ra A Rf Db Sg Bh Hs Mt L La Ce Pr Nd Pm Sm Eu Gd Tb Dy Ho Er Tm Yb Lu A Ac Th Pa U Np Pu Am Cm Bk Cf Es Fm Md No Lr 2 17 18 He 1 F Ne 2 S Cl Ar 3 As Se Br Kr 4 Sn Sb Te I Xe 5 Pb Bi Po At Rn 6 7

Atomic Spectroscopy (I) Atomic Absorption Spectroscopy Graphite Furnace AAS ICP-Mass Spectroscopy Inductively Coupled Plasma Optical Emission Spectroscopy Nucleus Electron 3

Atomic Spectroscopy (II) High Precision FAAS ICP-MS Quantitation High Sensitivity Low Detection Limits GFAAS ICP-OES Multi-element Simultaneous Analysis 4 Spectral Interferences

ICP-MS Schematic Diagram 5. Isolation Valve 8. Detector 3. Plasma 2. Spray Chamber 4. Off-axis Lens 6. ORS 1. Nebulizer 5 7. Mass Filter

Sample Introduction Device Ar blend gas Sample solution Babington Nebulizer To ICP Al insulation cover Ar carrier gas Peltier cooling device Cooling water 6

Mass flow Control 2. Spray Chamber 4. Interface 6. Ion Lenses Auxiliary Gas (1 L/min) Carrier Gas (1. 2 L/min) + Sample Blend Gas (0. 6 L/min) Plasma Gas (15~16 L/min) 7

Ionization by Plasma 2. Spray Chamber ID 2. 5 mm, Flow 0. 2~0. 4 ml/min 1. Drying 3. Atomization + 2. Decomposition 8 4. Ionization

Distribution of Plasma 27. 12 MHz Sample S 40 MHz 27. 12 MHz S 40 MHz 9

Cool Plasma Interfere nce Work coil Torch Shield plate 10 39 K 38 Ar 1 H 40 Ca 40 Ar 56 Fe 40 Ar 16 O

Cool Plasma Normal Plasma Cool Plasma Shield plate • Forward Power: 1300 W • Forward Power: 900 W • Sampling Depth: 7 mm • Sampling Depth: 13 mm • Carrier Gas Flow: 1. 2 ml/min • Carrier Gas Flow: 1. 7 ml/min 11

Ionization Efficiency Mg Mg, Fe, As Fe Cl As Ar Cl Ar 12

Optimum gas flow Sensitivity Co Ar. H Ar. O Carrier gas flow 13

Extraction Lens Sampling cone Twin Extraction Lenses Skimmer cone 14

Why need ORS? n There are some applications where cool plasma does not meet current and future required performance levels for certain analytes: n several interfered analytes in high (100 -1000 ppm) Si matrices n interfered analytes (Ti, Zn) in high matrix acids H 2 SO 4 and H 3 PO 4 Interference Matrix 39 K 38 Ar 1 H UPW 40 Ca 40 Ar UPW 56 Fe 40 Ar 16 O UPW 51 V 35 Cl 16 O HCl 52 Cr 35 Cl 16 O 1 H HCl 75 As 40 Ar 35 Cl HCl 48 Ti 32 S 16 O H 2 SO 4 64 Zn 32 S 16 O H 2 SO 4 63 Cu 31 P 16 O H 3 PO 4 68 Zn 31 P 18 O 1 H H 3 PO 4 24 Mg 12 C Organics 52 Cr 40 Ar 12 C Organics Agilent’s Octopole Reaction Cell can remove these interferences… 15

Off-axis Lens 16

Dissociation He As 75 amu Ar 40 amu Ar Ar Cl Cl Cl 75 amu 35 amu 17

Energy Transfer 75 amu He As Ar 75 amu Cl Electric Potential (Quadrupole) 18

Reaction mode Charge Transfer Ar+ + H 2+ + Ar (neutral) Proton Transfer Ar 2+ + H 2 (80 amu) Ar 2 H+ + H (81 amu) 19

Mass Filter • True Hyperbolic Quadrupole • 3 MHz RF Generator • Peak Shape • Abundance Sensitivity 3 MHz 20

Dual Electron Multiplier M+ e e Dynode 21 Fast Analogue Pulse Counting Detection

Wide Dynamic Range 1000 ppm • Dynamic Range: 9 orders • Analog Mode 1 ppt • Pulse Counting Mode • Solid type Multiplier 22

ICP-MS Schematic Diagram 5. Isolation Valve 8. Detector 3. Plasma 2. Spray Chamber 4. Off-axis Lens 6. ORS 1. Nebulizer 23 7. Mass Filter

Flexibility [I-Autosampler] [HPLC-ICP-MS] [ORS Technology] [GC-ICP-MS] [Organic Kit] 24

Sample Type • Waters • Chemicals • Semiconductor • Food • Geological • Clinical • Forensic • Petrochemical • Nuclear 25