1 nm RD Update K EvansLutterodt 1 BROOKHAVEN

1 nm R+D: Update K. Evans-Lutterodt 1 BROOKHAVEN SCIENCE

Outline for 1 nm R&D 1) 2) 3) 4) Our current approaches: MLL’s and kinoform Kinoform issues and progress A. Recent results from kinoforms B. Calculations of ultimate kinoform performance C. Etching status. MLL progress. A. Personnel B. Proposed R+D Facilities: plans and schedule C. Test plans for 1 nm optics including APS beamlines Progress towards 10 nm testing station (design, components) 2 BROOKHAVEN SCIENCE

Paths to 1 nm; Brief review Optic Type Comment 1. Single bounce Solid Metal Mirrors X 2. Binary Zone Plates X For examples and results see: G. Ice, ESRF, Spring 8, . . . W. Yun(Xradia), . . 3. Solid Refractive lenses 4. Multilayer Mirrors X Lengeler, Schroer Hignette 5. Multilayer Lens Pursued by ESRF, Spring 8 NSLSII R&D 6. Kinoform NSLSII R&D Evans-Lutterodt 3 Maser(CNM/APS) BROOKHAVEN SCIENCE

Multilayer Laue Lenses • Deposit varied line-spacing grating on flat substrate (thinnest structures first!) Varied linespacing grating • Section to 5 -20 m thickness (high aspect ratio structure) • Assemble two into a single device (MLL) substrate Depth-graded multilayers on flat Si substrate CNM, APS group: Maser et al. < 20 nm performance! 4 BROOKHAVEN SCIENCE

Kinoform Optics Instead of solid refractive optic: Use a kinoform: K. E-L et al. (2003) One can view the kinoform equivalently as NSLS results as of last EFAC meeting 600 nm a) A blazed zone plate b) An array of coherently interfering micro -lenses. 5 BROOKHAVEN SCIENCE

2) Kinoforms 6 BROOKHAVEN SCIENCE

2) Kinoforms Kinoform Status as of last EFAC: • Measured kinoform resolution: 600 nm • Theoretical basis not generally accepted • Etching issues 7 BROOKHAVEN SCIENCE

Kinoform results from 1 st run at APS (BL 8 IDI) ion t a fic Spot Size gni a m De s=82 nm Diffraction limit Focal Length 200 micron aperture used 300 micron aperture manufactured Near diffraction limit. Diffraction size 0. 44 /NA = 44 nm Demag size = 15 nm Net = 46 nm 8 BROOKHAVEN SCIENCE

Theoretical basis for Kinoform optics Partial resolution: Numerical calculation of NA=0. 4 kinoform for optical wavelengths, refractive index > 1. Applied Optics, Vol. 28, (1989) Issue 5, pp. 976“Optical performance of holographic kinoforms” Dale A. Buralli, George Michael Morris, and John R. Rogers Cases considered in paper 1) Paraxial ( to order x 2) 2) Non-Paraxial (exact) 3) Finite thickness 9 BROOKHAVEN SCIENCE

What happens if you use the wrong lens profile? • Using the exact integral • But using a parabolic approximation for the lens profile: NA=0. 1 NA=0. 2 Do not get expected performance for large NA 10 BROOKHAVEN SCIENCE

Performance of Exact Lens Profile • Using the exact integral NA= 0. 1 • Using exact lens profile. Get diffraction limited performance even at large NA NA= 0. 4 (One caveat: Only thin lens calculation done to date) 11 BROOKHAVEN SCIENCE

Summary of kinoform theory paper For a short kinoform structure theoretical basis is now established for diffraction limited performance to NA ~ 0. 4 We still need to: Provide a numerical basis for compound lenses Develop numerical density matrix thick lens calculator (MLL+) Include the effect of imperfections ( Roughness, verticality) 12 BROOKHAVEN SCIENCE

Kinoform Lens Fab We have acquired a new skill at BNL; etching. E-beam OLD Design BNL, APS Lucent Etching Testing Design NEW BNL, APS Lucent E-beam Etching 13 Testing BROOKHAVEN SCIENCE

Status of Si etching; (Abdel Isakovic, Post-doc) • Purchased machine was Cryo-process only. • Home grown cyclical cryo-etch process developed; • Better (deeper, but more vertical) than company-provided recipe. • Manuscript in process Etching performed at BNL 2. 5 microns/minute 14 BROOKHAVEN SCIENCE

Etching • The CFN had purchased the oxford plasma with cryo-etch, but not Bosch process license and hardware add-ons. • NSLS 2 had planned to purchase the Bosch license and additional hardware, but the CFN has decided to make the purchase instead. PO has been signed. • Diamond etching started; industrial and electronic grade 0. 65 nm/minute, comparable surface finish. 15 BROOKHAVEN SCIENCE

Timelines for Kinoform(Lehman, 12/06) FY 07 • Introduce etching RD program • Measure 60 nm lenses • Improve theoretical underpinning • Improve measurement techniques to enable lens characterization FY 08 • Develop Deep Vertical Si etching • Optimized E-beam Si process to allow many lens writes • Develop etches for In. Sb, C, Si. • Test Compound Si lens sub 40 nm FY 09 • Develop E-beam for alternate materials • Test Alternate materials lens in xray • Test sub 20 nm lens in xray FY 10 • Test sub 10 nm lens FY 11 • Test sub 5 nm lens FY 12 • Test 1 nm lens 16 BROOKHAVEN SCIENCE

3) Multi-layer Laue Lenses 17 BROOKHAVEN SCIENCE

Timelines for MLL(Lehman, 12/06) FY 07 • Explore materials for single crystal MLL approach. • Explore techniques to deposit multi-layers in wedged MLL geometry. • Carry out coupled wave (vector) calculations of MLL to determine sensitivity to errors. • Develop positioning techniques to mount and manipulate up to 4 MLL sections FY 08 • Develop techniques to deposit multi-layers for wedge MLL geometry • Develop metrology capable of determining zone width and placement to <1 nm resolution. FY 09 • Growth effort continues for 1 nm MLLs • Design a prototype MLL device (optics and mechanics) with 1 nm limit • Develop techniques to slice an MLL section from graded multilayer FY 10 • Construct 1 nm prototype device 18 BROOKHAVEN SCIENCE

Near term MLL issues Hire deposition scientist (Offer imminent) Hire Theoretician (Serious candidates, Discussions) Space identified for lab; planning for refurbishing 19 BROOKHAVEN SCIENCE

1 nm R+D Lab space needs Nano-positioning Lab: Space needed for testing of engineering concepts. Vibrationally quiet, may need small thermal enclosures. No special utility requirements. Optics Metrology Lab: Space needed for next generation LTP and ancillary equipment. Will need large thermally isolated space, with controlled air-flow. No special utility requirements. MBE/Depositioning Lab: Space needed for multilayer deposition effort. Large MBE system, UHV chambers. Associated characterization hardware e. g. STM. Utility requirements still to be determined. 20 BROOKHAVEN SCIENCE

1 nm R+D Lab space needs (cont. ) X-ray reflectivity Lab: To include rotating anode or tube source for Laue work and simple reflectivity measurements. To be combined with crystal preparation facility for 0. 1 me. V effort. May have more significant power requirements. Wet Lab: For etching work, including that required for 0. 1 me. V effort. Will require fume hood. Effort currently underway to identify space at BNL for these efforts. One potential candidate is building 703, which while it will require rennovation (cost estimate is being developed now) will be able to co-locate all these needs, together with office space for researchers. 21 BROOKHAVEN SCIENCE

4) Nanopositioning and Testing 22 BROOKHAVEN SCIENCE

Progress in Nano-positioning + 100 micron range XYZ 1 nm step size Capacitance encoder for feedback 25 mm travel range 80 nm step-size Glass encoder on stage Integrated with 8 IDI beamline programs Performs satisfactorily down to 10 nm stepping +-3 nm Borrowed hardware above; we are beginning procurement 23 BROOKHAVEN SCIENCE

Short term lens testing needs • Beamtime – 2 days a month APS • Can we improve NSLS X 13 B stability? Will a different mono do it. ? • Test bench stages ( 5 -10 nm resolution), enclosed, temperature stable • Design • Procure • Analysis • Begin developing other methods: Phase retrieval methods (Fienup) 24 BROOKHAVEN SCIENCE

1 nm R&D Summary §Rapid progress in kinoform. §Lab space needs for whole optics effort has been identified; potential building identified. §Offer imminent for deposition candidate. §Candidates for theorist position and 1 nm group leader have been identified, discussions underway. 25 BROOKHAVEN SCIENCE